IC设计
2 Posts
仿真 期末项目要用Athena做一个CMOS制造流程，结构如图。 仿真结果： 仿真数值： Extracted parameters（The data must be clearly given, and the screenshots are needed for prove） The step 5, extract the nwell junction depth 05nwell = 0.742309um The step 7, extract the thickness of SiO2 inside Nwell 07tox_in_nwell = 0.210375um The step 7, extract